来自MSN

How To Create A Website In 7 Minutes (Wordpress Tutorial For Beginners)

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IEEE

Mask Assignment and DSA Grouping for DSA-MP Hybrid Lithography for Sub-7 nm Contact/Via Holes

Abstract: Directed self assembly (DSA) is a very promising candidate for the sub-7 nm technology nodes. To print such small dimensions, multiple patterning (MP) is likely to be used to print the ...