Fundamentals of Industrial Process, Measurement, and Control (FG05) is a lecture-based course that provides an overview of industrial measurement and control. Technicians, engineers and managers learn ...

This publication serves as a high-level introduction to systems engineering for instrumentation and control at nuclear facilities. Systems engineering is a holistic, interdisciplinary and cooperative ...

With the continued need for shrinking pattern dimensions, semiconductor manufacturers continue to implement more complex patterning techniques, such as advanced multi-patterning, for the 10nm design ...

Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years. In previous work we described a scenario where optical overlay ...

Onto Innovation Inc. (ONTO) recently augmented its award-winning Atlas family with the introduction of the Atlas G6 optical critical dimension (OCD) metrology system. Designed specifically for the era ...